Ultima IV

We give you full support


Powder diffraction, thin film diffraction, SAXS, pole figure, residual stress and in-plane experiments


  • Fully automated optical alignment under computer control.
  • Optional in-plane diffraction arm for in-plane measurements without reconfiguration.
  • Focusing and parallel beam geometries without reconfiguration with CBO optics.
  • Small angle X-ray scattering (SAXS) capabilities.
  • Various automated non-ambient stages are available.


The Ultima IV represents the state-of-the-art in multipurpose X-ray diffraction (XRD) systems. Incorporating Rigaku’s patented cross beam optics (CBO) technology for permanently mounted, permanently aligned and user-selectable parallel and focusing geometries, the Ultima IV X-ray diffractometer can perform many different measurements…fast.

Engineered for Performance

One can switch very fast between different types of experiments which leads to a very good performance. Individual experiments are optimized with accessories like the D/teX Ultra high-speed position sensitive detector system, but the speed between experiments is radically improved with the combination of the automated alignment and CBO.

Designed for Flexibility

Today in the market Ultima IV is the only XRD system that incorporates fully automatic alignment. When coupled with CBO and the in-plane arm, the automatic alignment capability makes the Ultima IV X-ray diffractometer the most flexible system available for multipurpose applications.

Functionality Redefined

In the Ultima IV XRD system, CBO technology eliminates time spent switching geometries, enables everyday users to run both sets of experiments without the need to reconfigure the system, and reduces wear and possible optic damage associated with the recurrent switching process. CBO and automatic alignment combine for the ultimate in functionality for: micro-crystalline diffraction, thin-film diffraction, small angle scattering, and in-plane scattering.

Specifications Table

Product name

Ultima IV


X-ray diffraction


Powder diffraction, thin film diffraction, SAXS, pole figure, in-plane and non-ambient experiments


Multipurpose θ-θ X-ray diffractometer

Core attributes

3 kW sealed X-ray tube, D/teX Ultra silicon strip detector, independent θ-θ geometry

Core options

Many attachments, 10-position sample changer and other sample holders


External PC, MS Windows_OS, SmartLab Studio-II software


HT 1500 high temperature attachment

Automated variable temperature stage for in-situ X-ray diffraction measurements of materials at ambient and elevated temperatures (up to 1500°C). The stage may be operated in air, gas, vacuum, or under inert gas such as helium or nitrogen. The sample is heated radiantly for reduced heat gradients within the sample. Automated z translation within the stage assures precise sample positioning even in the presence of thermal expansion of the sample.

Reactor X high temperature attachment for reactive gases

Reactor X allows measurements to be performed under high temperature (RT – 1000°C) in vacuum, inert gas, reactive gas, or mixture of these. Infrared heating enables rapid heating and cooling of the sample and use of wide variety of sample holders so that a suitable sample holder material can be selected according to the combination of the sample, gas, and applied temperature.

Advanced thin film attachment

Multipurpose attachment for the precise alignment of thin film samples. Fully automated alignment provides extreme ease in the positioning of samples for X-ray reflectivity, in-plane diffraction, and orientation analysis. Utilizes the Rx/Ry design for the most flexible reciprocal space scanning options.