traceCLEAN
Acid steam cleaning system
traceCLEAN
Acid steam cleaning system
traceCLEAN assures best cleaning quality of your TFM, glass and quartz parts for ICP/ICP-MS accessories. Any trace metal contaminants that are present in the cleaning acid stay within the reservoir and do not come in contact with the cleaned trace accessories.
Features
- Versatile
(For all laboratory apparatus, either TFM, glass and quartz parts) - Fully automated and safe(No operator exposure to acid vapors.)
- Highly productive(Fast, convenient, clean, and fully automated.)
- Cost-effective and productive(No changing of acids or soaking required.)
How traceCLEAN Works
Traditional cleaning methods require several hours and occupy valuable space in the fume hood. The traceCLEAN process ensures greater cleaning efficiency through freshly distilled hot vapours of nitric acid that leach metal contaminants from the items. Place the items to be cleaned in the traceCLEAN, through the rotating design of the holder, which simplifies the introduction and removal of all items. Select the program or create a new one and press “Start” on the touch screen terminal.
Compare acid steam cleaning to acid leaching
The container to be cleaned is placed over a PTFE coated glass rod. Acid in the lower reservoir is heated, and purified acid vapor travels up through the glass rod and condenses on the container, removing surface contamination. This method of cleaning is a preferred alternative to the soaking preconditioning methods for the following reasons:
- The trace metal contamination found in the reagent grade acid remains in the lower reservoir and does not come in contact with the component to be cleaned.
- The clean component does not remain in contact with the cleaning acid after the surface contamination is removed.
- The critical surfaces of the clean component are dry when the cleaning process is complete. This eliminates the need for rinsing and air drying.
- The cleaning process takes place in a sealed container which minimizes airborne contamination and provides a clean environment for the components to be stored until they are needed.